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NUCLEATION AND PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF ULTRANANOCRYSTALLINE DIAMOND FILMS ON DIFFERENT SUBSTRATES

Basic information
Original title:NUCLEATION AND PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF ULTRANANOCRYSTALLINE DIAMOND FILMS ON DIFFERENT SUBSTRATES
Authors:Monika Karásková, Lenka Zajíčková, Vilma Buršíková, Ondřej Jašek, Daniel Franta, Jiřina Matějková, Petr Klapetek
Further information
Citation:KARÁSKOVÁ, Monika, Lenka ZAJÍČKOVÁ, Vilma BURŠÍKOVÁ, Ondřej JAŠEK, Daniel FRANTA, Jiřina MATĚJKOVÁ and Petr KLAPETEK. NUCLEATION AND PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF ULTRANANOCRYSTALLINE DIAMOND FILMS ON DIFFERENT SUBSTRATES (NUCLEATION AND PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF ULTRANANOCRYSTALLINE DIAMOND FILMS ON DIFFERENT SUBSTRATES). In CESPC II Book Of Extended Abstracts. 1. vyd. Brno: Masarykova Univerzita, 2008. p. 159-160, 2 pp.Export BibTeX
@inproceedings{808173,
author = {Karásková, Monika and Zajíčková, Lenka and Buršíková, Vilma and Jašek, Ondřej and Franta, Daniel and Matějková, Jiřina and Klapetek, Petr},
address = {Brno},
booktitle = {CESPC II Book Of Extended Abstracts},
edition = {1},
keywords = {ultrananocrystalline diamond; PECVD; nucleation},
language = {eng},
location = {Brno},
pages = {159-160},
publisher = {Masarykova Univerzita},
title = {NUCLEATION AND PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF ULTRANANOCRYSTALLINE DIAMOND FILMS ON DIFFERENT SUBSTRATES},
year = {2008}
}
Original language:English
Field:Plasma physics
Type:Article in Proceedings
Keywords:ultrananocrystalline diamond; PECVD; nucleation

Ultrananocrystalline diamond (UNCD) films were deposited in microwave bell jar plasma reactor of ASTeX type. The applied mw power, pressure and substrate temperature were from 800 to 950 W, 7.5 kPa and from 1000 to 1100K. The deposition mixture were from 2 to 9.4 percent of methane in methane/hydrogen gas feed. Reactor was modified by rf capacitive discharge providing a negative dc self bias -125V at the substrate holder, for using bias enhanced nucleation (BEN) methode as a pretreatement method. The mechanical properties were studied by depth sensing indentation technique using FISHERSCOPE H100 XYp, the surface morphology of the deposited films was studied by atomic force microscopy (AFM) and scanning electron microscopy (SEM).The UNCD films exhibited high hardness of 70 GPa, elastic modulus of 375 GPa and very low roughness in the range from 9 to 18 nm.

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