Publication details
Způsob snížení nebo odstranění organické a anorganické kontaminace vakuového systému zobrazovacích a analytických zařízení a zařízení k jeho provádění
| Title in English | Method of reducing or removing organic and/or inorganic contamination of vacuum system of display and analytic devices and apparatus for making the same |
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| Authors | |
| Year of publication | 2015 |
| Type | Patent |
| MU Faculty or unit | |
| Publisher | Úřad průmyslového vlastnictví |
| State | Czech Republic |
| Patent's number | 305097 |
| Description | In the present invention, there is disclosed a method of reducing or removing organic and or inorganic contamination of vacuum system of display and analytic devices, where at least a portion of the inner surface area of a space to be vacuumed is provided with a photocatalytic layer , whereby at least a portion of this photocatalytic layer is cooled to a temperature in the range of from about 0 to about 280 K, wherein the said photocatalytic layer is at least partially irradiated by electromagnetic radiation , which activates a photocatalytic reaction of this photocatalytic layer with adsorbed gases of the vacuumed interior atmosphere of the vacuum system. The reaction then degrades contaminants and reduces concentration thereof and, or concentration of water in the vacuumed interior of the vacuum system. The above-described method and apparatus for making the same make it possible to reduce undesired organic and inorganic contamination of vacuum systems not only in the manufacturing process, but also enables reduction of contamination in already operated systems such as SEM, TAM, SEM FIB, XPS, MALDI, SIMS and other analytic and inspection techniques. |
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