Publication details

Metody měření polovodičových součástek: rtg, optická spektroskopie

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Title in English Masurement methods of semiconductor devices: X-ray, optical spectroscopy
Authors

CAHA Ondřej HUMLÍČEK Josef

Year of publication 2020
MU Faculty or unit

Central European Institute of Technology

Citation
Description The report deals with methods of semiconductor material analysis. X-ray diffraction methods of elastic strain determination, doping inhomogeneities is highly doped silicon. The optical spectroscopy was used to determine impurity concentration in highly doped silicon wafers.
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