High temperature investigations of Si/SiGe based cascade structures using x-ray scattering methods

• Authors: MEDUŇA Mojmír; NOVÁK Jiří; FALUB Claudiu; CHEN Gang; BAUER Günther; TSUJINO Soichiro; GRÜTZMACHER Detlev; MÜLLER Elisabeth; CAMPIDELLI Yves; KERMARREC Olivier; BENSAHEL Daniel; SCHELL Norbert
• Year of publication: 2005
• Type: Article in Periodical
• Magazine / Source: J. Phys. D: Appl. Phys.
• MU Faculty or unit: Faculty of Science
• Field: Solid matter physics and magnetism
• Keywords: X-ray reflectivity; SiGe; Annealing; Diffusion
• Description: Temperature stability of SiGe/Si (80% Ge) structures was studied using x-ray reflectivity during in-situ annealing around temperature 790C.

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