Plasma treatment of silicon surface by DCSBD

• Authors: SKÁCELOVÁ Dana; SŤAHEL Pavel; HANIČINEC Martin; ČERNÁK Mirko
• Year of publication: 2011
• Type: Article in Periodical
• Magazine / Source: Acta Technica CSAV
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: Silicon surface plasma treatment DBD discharge AFM contact angle measurement
• Description: This paper focuses on the plasma treatment of crystalline Si (100) surface. The plasma was generated by Diffuse Coplanar Surface Barrier Discharge (DCSBD) at atmospheric pressure using ambient atmosphere. Surface free energy of silicon was investigated by contact angle measurement and surface morphology was studied by Atomic force microscope. Plasma treatment increases the surface wettability and AFM measurements showed that the plasma influences also the surface roughness.

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