Informace o publikaci
Low-temperature reduction of Graphene Oxide by atmospheric pressure hydrogen plasma
| Autoři | |
|---|---|
| Rok publikování | 2016 |
| Druh | Článek ve sborníku |
| Fakulta / Pracoviště MU | |
| Citace | |
| www | https://www.escampig2016.org |
| Obor | Fyzika plazmatu a výboje v plynech |
| Klíčová slova | graphene oxide, hydrogen plasma, atmospheric pressure, DCSBD |
| Popis | The non-equilibrium hydrogen plasma generated at atmospheric pressure using Diffuse Coplanar Surface Barier Discharge (DCSBD) was used as an alternative low-temperature method for reduction of Graphene Oxide (GO). GO layers were prepared by modified Hummers method and deposited on Si/SiO 2 substrate by modified Langmuir-Schaefer method. Extremely short reduction times (<5 s) in hydrogen DCSBD plasma led to the similar level of GO reduction as obtained after the commonly used thermal vacuum annealing method for 30 minutes. |