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NANOSTRACTURING OF P OLYMETHYL METHACRYLA TE SURFACE WITH USE OF HIGLY ETCHING PLASMA

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KELAR Jakub TUČEKOVÁ Zlata KRUMPOLEC Richard ZEMÁNEK Miroslav

Rok publikování 2018
Druh Článek v odborném periodiku
Časopis / Zdroj PLASTKO 2018 Sborník příspěvků z konference, ISBN13: 978-80-7454-727-0
Citace
Popis The study presents the results of polymethyl methacrylate (PMMA) surface modification induced by highly etching atmospheric pressure plasma. For plasma modification of flexible PMMA sheets, a technology capable to meet the industrial production requirements based on diffuse coplanar surface barrier discharge (DCSBD) was used. Change of wetting phenomena of PMMA surface with plasma treatment time and gas mixtures was demonstrated. To observe the etching of the polymer surface, a scanning electron microscopy (SEM) was used. As observed, plasma etching in hydrogen gas led to the formation of nanoscale pillar-like structures on modified PMMA surface. We have achieved full range change of wetting (reference water contact angle value of 78°) from the hydrophobic surface for plasma containing pure hydrogen ~120° to hydrophilic PMMA surface for plasma treatment in nitrogen-containing plasma ~10°.

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