Informace o publikaci
Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films
| Autoři | |
|---|---|
| Rok publikování | 2000 |
| Druh | Článek ve sborníku |
| Konference | Abstracts of Invited Lecturers and Contributed Papers ,XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases |
| Fakulta / Pracoviště MU | |
| Citace | |
| Obor | Fyzika plazmatu a výboje v plynech |
| Klíčová slova | PECVD; Diamond-like Carbon; Protective thin films; Silicon doping; |
| Popis | Deposition of diamond like films with an incorporation of silicon by plasma enhanced CVD technique from mixture of methane, argon and hexamethyldisiloxane (HMDSO). Study of the influence of the percentage of HMDSO in the mixture on film properties. |
| Související projekty: |