doc. RNDr. Tomáš Homola, PhD.
Associate professor, Plasma Nanotechnologies and Bioapplications
Office: pav. 07/02003
Kotlářská 267/2
611 37 Brno
Phone: | +420 549 49 4974 |
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E‑mail: |
social and academic networks: |
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Total number of publications: 113
2021
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Magnetic layers for applications in printed electronics
Year: 2021, type: Conference abstract
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Non-hydrolytic sol-gel route to a family of hybrid mesoporous aluminosilicate ethanol dehydration catalysts
Journal of Materials Science, year: 2021, volume: 56, edition: 25, DOI
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Plasma oxidation of printed polysiloxane layers
Proceedings 13th International Conference on Nanomaterials - Research & Application, year: 2021
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Rapid Atmospheric Pressure Ambient Air Plasma Functionalization of Poly(styrene) and Poly(ethersulfone) Foils
Plasma Chemistry and Plasma Processing, year: 2021, volume: 41, edition: 3, DOI
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Recent developments in applications of plasma to the manufacture of flexible solar cells
Year: 2021, type: Conference abstract
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Structural and magnetic properties of Fe-oxide layers prepared by inkjet printing on Si-substrate
NANOCON 2020: 12th International Conference on Nanomaterials - Research & Application, year: 2021
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The effect of atmospheric cold plasma cleaning of FTO substrates on the quality of TiO2 electron transport layers for printed carbon-based perovskite solar cells
NANOCON 2020: 12th International Conference on Nanomaterials - Research & Application, year: 2021
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The effect of rapid atmospheric plasma treatment of FTO substrates on the quality of TiO2 blocking layers for printed perovskite solar cells
Materials Science in Semiconductor Processing, year: 2021, volume: 131, edition: August, DOI
2020
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A comparison of photolytic, photochemical and photocatalytic processes for disinfection of recirculation aquaculture systems (RAS) streams
Water Research, year: 2020, volume: 181, edition: AUG 15 2020, DOI
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A New Approach to the Crystallization of Perovskite Films by Cold Hydrogen Atmospheric Pressure Plasma
Plasma Chemistry and Plasma Processing, year: 2020, volume: 40, edition: 2, DOI