Publication details

Comparison of nc-TiC/a-C:H Films Prepared by PVD-PECVD Process at Low and High Ion Bombardment



Year of publication 2012
Type Conference abstract
MU Faculty or unit

Faculty of Science

Description Two series of nc-TiC/a-C:H coatings with varying chemical composition were prepared using a deposition process consisting of titanium target sputtering in argon/acetylene atmosphere combined into a hybrid PVD-PECVD. The range of chemical compositions was chosen in order to achieve optimal hardness of the coatings – from 30 at.% to 70 at.% Ti. The films were ~ 5 microns thick with 700 nm titanium interlayer to promote the adhesion of the coatings to industrially important substrates like cemented tungsten carbide and high speed steel. The different levels of ion bombardment were achieved by different magnetic fields on the cathode. A well-balanced magnetic field was used for low ion bombardment of the growing film and a strongly unbalanced magnetic field was used for high bombardment. We kept all other deposition parameters such as pressure and substrate temperature constant for both magnetic field configurations as to single out the effect of the ion bombardment on the properties of the film. Our main goal is the comparison of structure, chemical composition and mechanical properties of nc-TiC/a-C:H coatings prepared at two distinctively different ion bombardment levels.
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