LASER INDUCED FLUORESCENCE OF ATOMIC OXYGEN AND HYDROXYL RADICALS IN DIELECTRIC BARRIER DISCHARGE

• Authors: DVOŘÁK Pavel; MRKVIČKOVÁ Martina; PROCHÁZKA Vojtěch; VORÁČ Jan
• Year of publication: 2014
• Type: Conference abstract
• MU Faculty or unit: Faculty of Science

Attached files

• LASER_INDUCED_FLUORESCENCE_OF_ATOMIC_OXYGEN_AND_HYDROXYL_RADICALS_IN_DIELECTRIC_BARRIER_DISCHARGE.pdf

• Description: Atomic oxygen and hydroxyl (OH) radicals were detected in a volume dielectric barrier discharge by laser induced fluorescence. The discharge was ignited in a mixture of argon, hydrogen and oxygen in a plasma reactor that is usually used for decomposition of hydride compounds for analytic purposes. The concentration of atomic oxygen radicals was shown to be constant during the whole 42 us period of the discharge. With the exception of high oxygen flow rates, high concentrations of both O and OH radicals was found only in a small (few millimeters long) area close to the inlet of gases.

Related projects

• CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
• Spektroskopické studium rekombinace povrchového náboje v dielektrických bariérových výbojích