Publication details

ENVIRONMENTAL STABILITY OF NITROGEN CONTAINING PLASMA-POLYMERIZED HEXAMETHYLDISILOXANE FILMS

Authors

KELAROVÁ Štěpánka PŘIBYL Roman HOMOLA Vojtěch VÁCLAVIK Richard STUPAVSKÁ Monika KELAR Lukáš BURŠÍKOVÁ Vilma

Year of publication 2018
Type Article in Proceedings
Conference 9TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH & APPLICATION (NANOCON 2017)
MU Faculty or unit

Faculty of Science

Citation
Keywords Plasma polymer films; plasma enhanced chemical vapor deposition; FTIR; nanoindentation
Description Nitrogen incorporated organosilicon films were prepared by means of plasma enhanced chemical vapor deposition using capacitively coupled RF glow discharges in mixtures of hexamethyldisiloxane and nitrogen. The flow rate of nitrogen was 2-10 sccm and the flow rate of hexamethyldisiloxane was 0.3-0.4 sccm. The power supply of CCP was 50 W. The environmental stability of the deposited films was studied using confocal microscopy, spectroscopic ellipsometry and FTIR (Fourier Transform Infrared Spectroscopy). The humidity induced structure changes resulted in substantial change of mechanical properties of the studied films. The mechanical properties were studied using nanoindentation techniques.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.

More info