Publication details

The role of microwave plasma temperature during graphene nanosheets deposition on dielectric substrate: Modelling and experiment

Authors

KUBEČKA Martin TOMAN Jozef ŠNÍRER Miroslav JAŠEK Ondřej KUDRLE Vít JURMANOVÁ Jana

Year of publication 2020
Type Article in Proceedings
Conference NANOCON Conference Proceedings - International Conference on Nanomaterials
MU Faculty or unit

Faculty of Science

Citation
Web Web konference
Doi http://dx.doi.org/10.37904/nanocon.2019.8455
Keywords Graphene; microwave plasma; temperature; dielectric substrate
Attached files
Description The relation between plasma temperature and properties of graphene nanosheet layer deposited on Si/SiO2 substrate by decomposition of ethanol in microwave plasma torch discharge at atmospheric pressure was investigated in dependence on delivered microwave power and gas flow rates. Plasma modelling was carried out using COMSOL Multiphysics software with delivered microwave power, gas flow rates and experimental reactor geometry as input parameters. Results of the heat flow and fluid dynamics modelling were compared with substrate temperature measured by thermocouple integrated in quartz tube substrate holder. The graphene nanosheets layer was characterized by SEM, Raman spectroscopy and 4-point probe method. The layers were severals tens of micrometre thick and their sheet resistance varied from 2 to 40 kiloohm/sq. The properties of individual graphene nanosheets, 2D/G and D/G Raman band ratio, as well as the sheet resistance of their conductive network were correlated with the increase of plasma temperature with increasing microwave power. The substrate temperature increased linearly with delivered microwave power and the layer sheet resistance was decreasing with increasing microwave power and saturated at 2 kiloohm/sq and D/G ratio of 0.6.
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