Publication details

Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron sputtering

Authors

ELIÁŠ Marek SOUČEK Pavel VAŠINA Petr

Year of publication 2008
Type Article in Proceedings
Conference Book of Extended Abstracts of 2nd Central European Symposium on Plasma Chemistry
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords hybrid deposition process; hysteresis
Description Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron sputtering, proceeding
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