Publication details

Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics

Authors

ELIÁŠ Marek SOUČEK Pavel VAŠINA Petr

Year of publication 2009
Type Article in Proceedings
Conference Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8
MU Faculty or unit

Faculty of Science

Citation
Field Plasma physics
Keywords hybrid PVD-PECVD
Description Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics, proceeding
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