Publication details

Oxygen Precipitation in CZ Si Wafers after High Temperature Pre-annealing

Authors

MEDUŇA Mojmír CAHA Ondřej KUBĚNA Josef KUBĚNA Alan SVOBODA Milan BURŠÍK Jiří

Year of publication 2010
Type Conference abstract
MU Faculty or unit

Faculty of Science

Citation
Description In this work we study two stage and three stage annealing processes with application of Tabula rasa. The evolution of precipitates at various phases during annealing process for various temperatures was obtained from series of experimental techniques.
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