prof. Mgr. Petr Vašina, Ph.D.
ředitel ústavu – Ústav fyziky a technologií plazmatu
kancelář: pav. 06/01025
Kotlářská 267/2
611 37 Brno
telefon: | 549 49 6479 |
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sociální a akademické sítě: |
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Počet publikací: 381
2010
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Time resolved spectroscopy of high power pulsed microwave discharge in nitrogen
Proceedings of 20th Escampig, rok: 2010
2009
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Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process
Europhysics Letters, rok: 2009, ročník: 85, vydání: 1
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Higher harmonic frequencies of discharge voltages as extremely sensitive marker of state of RF reactive sputtering deposition process
Book of Contributed Papers of 17th Symposium on Applications of Plasma Processes, rok: 2009
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Higher harmonics of discharge voltage as tool to control accurately state of RF sputtering deposition process
Rok: 2009, druh: Konferenční abstrakty
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Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics
Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8, rok: 2009
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Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?
Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts, rok: 2009
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Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously
Rok: 2009, druh: Konferenční abstrakty
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Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen
Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8, rok: 2009
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Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions
Plasma Sources Science and Technology, rok: 2009, ročník: 18, vydání: 2
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On the oxygen addition into nitrogen post-discharge
Journal of Physics D: Applied Physics, rok: 2009, ročník: 42, vydání: 7