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Organosilicon plasma polymers deposited in trimethylsilyl acetate/CH4 plasma of capacitively coupled RF glow discharge

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KELAROVÁ Štěpánka STUPAVSKÁ Monika PŘIBYL Roman BURŠÍKOVÁ Vilma

Rok publikování 2021
Druh Článek ve sborníku
Konference NANOCON 2020: 12th International Conference on Nanomaterials - Research & Application
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www https://doi.org/10.37904/nanocon.2020.3773
Doi http://dx.doi.org/10.37904/nanocon.2020.3773
Klíčová slova Trimethylsilyl acetate; PECVD; XPS; microindentation; confocal microscopy
Popis Thin solid films based on organosilicon monomers are perspective in many branches of industry as well as for bioapplications. In the present study, plasma of RF capacitively coupled glow discharge in gaseous mixture of trimethylsilyl acetate (TMSA) monomer and methane was used to create SiOxCyHz coatings. This study monitors properties of resulting thin films (surface chemistry, wettability, surface structure and mechanical properties) in dependency on deposition parameters. The main subject of the presented research is the investigation of the relationship between the above-mentioned properties of prepared organosilicon coatings and the flow rate ratio of TMSA monomer and CH4 carrier gas applied during deposition process.
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