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Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene

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SCHMIDTOVÁ Tereza SOUČEK Pavel VAŠINA Petr SCHÄFER Jan

Rok publikování 2011
Druh Článek v odborném periodiku
Časopis / Zdroj Surface & Coatings Technology
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
Obor Fyzika plazmatu a výboje v plynech
Klíčová slova Hybrid PVD–PECVD process; Reactive magnetron sputtering; Hysteresis; Modelling
Popis Hybrid PVD–PECVD process of target sputtering in hydrocarbon containing atmosphere combines aspects of both conventional reactive magnetron sputtering (PVD) and plasma enhanced chemical vapour deposition (PECVD). Such process is being typically used for deposition of metal carbides embedded in hydrogenated carbon matrix. Compared to the conventional co-sputtering of metal and carbon targets, in the hybrid deposition process the source of the carbon is dissociated hydrocarbon vapour in plasma. The aim of this paper is to study the extent of similarities or differences between this hybrid process and the conventional reactive magnetron sputtering. We have chosen the sputtering of titanium target in acetylene containing atmosphere as a representative of the hybrid processes. We focused on experimental measurements of the hybrid PVD–PECVD process behaviour, the time necessary for the process to achieve steady-state conditions and basic modelling of the process.
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