prof. RNDr. Ivan Ohlídal, DrSc.
vedoucí pracoviště – Optika tenkých vrstev a povrchů pevných látek
kancelář: pav. 06/01031
Kotlářská 267/2
611 37 Brno
telefon: | 549 49 6244 |
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e‑mail: |
sociální a akademické sítě: |
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Počet publikací: 199
2016
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Optical characterization of SiO2 thin films using universal dispersion model over wide spectral range
Conference on Optical Micro- and Nanometrology VI, rok: 2016
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Simultaneous determination of optical constants, local thickness and roughness of ZnSe thin films by imaging spectroscopic reflectometry
Journal of Optics, rok: 2016, ročník: 18, vydání: 1, DOI
2015
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Dispersion model for optical thin films applicable in wide spectral range
Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, rok: 2015
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Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films
Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, rok: 2015
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Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry
Applied Surface Science, rok: 2015, ročník: 350, vydání: SEP, DOI
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Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry
Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, rok: 2015
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Universal dispersion model for characterization of optical thin films over wide spectral range: Application to hafnia
Applied Optics, rok: 2015, ročník: 54, vydání: 31, DOI
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Wide spectral range characterization of antireflective coatings and their optimization
Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, rok: 2015
2014
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Antireflexní vrstva z materiálů Al2O3/SiO2 pro hlubokou ultrafialovou (DUV) oblast spektra na vlnové délce 266nm
Rok: 2014
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Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry
Thin Solid Films, rok: 2014, ročník: 571, vydání: november, DOI