Publication details
STRUCTURING OF POLYMETHYLMETHACRYLATE SUBSTRATES BY REDUCING PLASMA
| Authors | |
|---|---|
| Year of publication | 2019 |
| Type | Article in Proceedings |
| Conference | 22nd Symposium on Applications of Plasma Processes (SAPP XXII) and the 11th EU-Japan Joint Symposium on Plasma Processing, Book of Contributed Papers |
| MU Faculty or unit | |
| Citation | |
| Web | https://neon.dpp.fmph.uniba.sk/sappxxii/download/SAPP_XXII_JSPP_XI_Book_of_Contributed_Papers.pdf |
| Keywords | polymer surface;surface structuring;reducing plasma;atmospheric pressure |
| Description | This contribution presents the results of plasma modification of rigid and flexible polymethyl methacrylate (PMMA) using Diffuse Coplanar Surface Barrier Discharge (DCSBD) generated in pure hydrogen at atmospheric pressure. After the several minutes of the plasma treatment, a timedependent and plasma gap-dependent formation of nanoscale pillar-like structures was observed on rigid and flexible PMMA surface. The structuring and etching of substrates were investigated by a scanning electron microscopy. Atomic force microscopy revealed an increase of surface roughness in the order of 10. |
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