Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison

• Authors: SONNENFELD Axel; TUN T. M.; ZAJÍČKOVÁ Lenka; KOZLOV K. V.; WAGNER H.-E.; BEHNKE J. F.; HIPPLER R.
• Year of publication: 2001
• Type: Article in Periodical
• Magazine / Source: Plasmas and Polymers
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: DBD
• Description: Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison

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