Publication details
In situ analysis of PMPSi thin films by spectroscopic ellipsometry
| Authors | |
|---|---|
| Year of publication | 2004 |
| Type | Article in Periodical |
| Magazine / Source | Jemná mechanika a optika |
| MU Faculty or unit | |
| Citation | |
| Field | Solid matter physics and magnetism |
| Keywords | spectroscopic ellipsometry; poly(methyl-phenylsilane) |
| Description | In the paper in situ monitoring of the UV-light-and thermal treatment of PMPSi thin films by real time spectroscopic ellipsometry and additional ex situ measurements are reported. In the in situ experiments the films were treated both under ultrahigh vacuum and oxygen atmosphere. The results of this study indicate systematic shift of the imaginary part of a complex dielectric function depending on the degree of treatment. |