Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron sputtering

• Authors: ELIÁŠ Marek; SOUČEK Pavel; VAŠINA Petr
• Year of publication: 2008
• Type: Article in Proceedings
• Conference: Book of Extended Abstracts of 2nd Central European Symposium on Plasma Chemistry
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: hybrid deposition process; hysteresis
• Description: Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron sputtering, proceeding

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