Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously

• Authors: VAŠINA Petr; SCHMIDTOVÁ Tereza
• Year of publication: 2009
• Type: Conference abstract
• MU Faculty or unit: Faculty of Science
• Description: Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously, proceeding

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