Publication details
Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering
| Authors | |
|---|---|
| Year of publication | 2021 |
| Type | Article in Periodical |
| Magazine / Source | Applied Surface Science |
| MU Faculty or unit | |
| Citation | |
| Doi | http://dx.doi.org/10.1016/j.apsusc.2021.149543 |
| Keywords | Titanium nitride thin films,Magnetron sputtering,Plasmonics,Spectroscopic ellipsometry,Electrical resistivity |
| Description | We report the effect of radiofrequency (RF) substrate biasing during the sputtering process on the structural, optical and electrical properties of TiN films. We employ spectroscopic ellipsometry as a sensible characterization method and we show that a moderate RF power, despite reducing the grain size, allows to achieve optimal plasmonic quality factors and a low resistivity. |