Publication details
X-ray diffraction and reflectance, raman scattering and photoluminiscence characterization of thermally annealed epitaxial Si 1-x Ge x layers
| Authors | |
|---|---|
| Year of publication | 1993 |
| Type | Article in Periodical |
| Magazine / Source | Thin Solid Films |
| MU Faculty or unit | |
| Citation | |
| Field | Solid matter physics and magnetism |
| Keywords | X-ray diffraction and reflectance; raman scattering and photoluminiscence characterization of thermally annealed epitaxial Si 1-x Ge x layers |
| Description | X-ray diffraction and reflectance, raman scattering and photoluminiscence characterization of thermally annealed epitaxial Si 1-x Ge x layers |
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