Publication details

Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications

Authors

FALUB Claudiu V. ROHRMANN Hartmut BLESS Martin MEDUŇA Mojmír MARIONI Miguel SCHNEIDER Daniel RICHTER Jan H. PADRUN Marco

Year of publication 2017
Type Article in Periodical
Magazine / Source AIP Advances
MU Faculty or unit

Faculty of Science

Citation
Web http://aip.scitation.org/doi/abs/10.1063/1.4973945
Doi http://dx.doi.org/10.1063/1.4973945
Field Solid matter physics and magnetism
Keywords ferromagnetic-resonance frequency; on-chip inductors; x-ray-scattering; thin-films; roughness; anisotropy; band
Description Soft magnetic Ni78.5Fe21.5, Co91.5Ta4.5Zr4 and Fe52Co28B20 thin films laminated with SiO2, Al2O3, AlN, and Ta2O5 dielectric interlayers were deposited on 8” Si wafers using DC, pulsed DC and RF cathodes in the industrial, high-throughput Evatec LLS-EVO-II magnetron sputtering system.
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