Publication details

Diffuse X-ray scattering from local chemical inhomogeneities in InGaN layers

Authors

HOLÝ Václav KRYSKO M. LESZCZYNSKI M.

Year of publication 2018
Type Article in Periodical
Magazine / Source Journal of Applied Crystallography
MU Faculty or unit

Faculty of Science

Citation
Web http://scripts.iucr.org/cgi-bin/paper?S1600576718007173
Doi http://dx.doi.org/10.1107/S1600576718007173
Keywords X-ray diffraction; diffuse scattering; chemical fluctuations; elasticity; InGaN
Description Diffuse X-ray scattering from random chemical inhomogeneities in epitaxial layers of InGaN/GaN was simulated using linear elasticity theory and kinematical X-ray diffraction. The simulation results show the possibility of determining the r.m.s. deviations of the local In content and its lateral correlation length from reciprocal-space maps of the scattered intensity. The reciprocal-space distribution of the intensity scattered from inhomogeneities is typical and it can be distinguished from other sources of diffuse scattering such as threading or misfit dislocations.

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