Publication details

Thermal stability of Ti/Ni multilayer Thin films

Authors

VÁCLAVIK Richard ZÁBRANSKÝ Lukáš SOUČEK Pavel SŤAHEL Pavel BURŠÍK Jiří FOŘT Tomáš BURŠÍKOVÁ Vilma

Year of publication 2021
Type Article in Proceedings
Conference NANOCON 2020: 12th International Conference on Nanomaterials - Research & Application
MU Faculty or unit

Faculty of Science

Citation
Web https://doi.org/10.37904/nanocon.2020.3776
Doi http://dx.doi.org/10.37904/nanocon.2020.3776
Keywords Ti/Ni; multilayers; magnetron sputtering; nanoindentation; annealing
Description In this work, thermal stability and mechanical properties of Ti/Ni multilayer thin films were studied. The multilayer thin films were synthesised by alternately depositing Ti and Ni layers using magnetron sputtering. The thickness of constituent layers of Ti and Ni varied from 1.7 nm to 10 nm, and one coating was deposited by simultaneous sputtering of both targets. Single crystalline silicon was used as a substrate. The effects of thermal treatment on the mechanical properties were studied using nanoindentation and discussed in relation to microstructure evaluated by X-ray diffraction. Annealing was carried out under low-pressure conditions for 2 hours in the range of 100–800°C.
Related projects:

You are running an old browser version. We recommend updating your browser to its latest version.

More info