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Thermal stability of Ti/Ni multilayer Thin films

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VÁCLAVIK Richard ZÁBRANSKÝ Lukáš SOUČEK Pavel SŤAHEL Pavel BURŠÍK Jiří FOŘT Tomáš BURŠÍKOVÁ Vilma

Rok publikování 2021
Druh Článek ve sborníku
Konference NANOCON 2020: 12th International Conference on Nanomaterials - Research & Application
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
www https://doi.org/10.37904/nanocon.2020.3776
Doi http://dx.doi.org/10.37904/nanocon.2020.3776
Klíčová slova Ti/Ni; multilayers; magnetron sputtering; nanoindentation; annealing
Popis In this work, thermal stability and mechanical properties of Ti/Ni multilayer thin films were studied. The multilayer thin films were synthesised by alternately depositing Ti and Ni layers using magnetron sputtering. The thickness of constituent layers of Ti and Ni varied from 1.7 nm to 10 nm, and one coating was deposited by simultaneous sputtering of both targets. Single crystalline silicon was used as a substrate. The effects of thermal treatment on the mechanical properties were studied using nanoindentation and discussed in relation to microstructure evaluated by X-ray diffraction. Annealing was carried out under low-pressure conditions for 2 hours in the range of 100–800°C.
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