Comparison of the ionization efficiency of two ionized physical vapour deposition processes: magnetron discharge assisted by microwave plasma or radio-frequency plasma

• Authors: DE POUSQUES Ludovic; IMBERT Jean-Christiphe; VAŠINA Petr; BOISSE-LAPORTE Caroline; TEULE-GAY Lionel; TOUZEAU Michel
• Year of publication: 2004
• Type: Article in Proceedings
• Conference: Prosseding of Ninth International Conference on Plasma Surface Engineering
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: IPVD; microwave; RF; magnetron
• Description: The objective of this work is to compare two IPVD processes developed in our laboratory, in particular the ionization efficiency of each system

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