Publication details

Spatial characterization of an IPVD reactor: neutral gas temperature and interpretation of optical spectroscopy measurements

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Year of publication 2005
Type Article in Periodical
Magazine / Source Plasma Sources Science and Technology
MU Faculty or unit

Faculty of Science

Field Plasma physics
Keywords physical vapor deposition; ionised physical vapor deposition; titanium; metal ionisation; density; magnetron
Description This paper deals with the characterization of an ionized physical vapour deposition (IPVD) reactor using an additional microwave plasma. The IPVD reactor was spatially characterized using optical emission spectroscopy, optical absorption spectroscopy and Langmuir probe measurements. A rectangular titanium target was used, the buffer gas was argon and the pressure was fixed at 4 Pa. The influence of the microwave power (between 0 and 900 W) and the magnetron discharge current (0.5 and 2 A) on the densities of the titanium species (neutral and ionic), argon emission line intensity and titanium and argon temperature variations was investigated. The titanium temperature and densities were measured using the pulsed resonant absorption spectroscopy technique. The neutral and ion fluxes on the substrate were deduced from these measurements. It was found that the ratio phi(Ti+)/phi(Ti-n) increases by a factor of 30 when additional microwave plasma is used. Moreover, we point out the temperature as a key parameter in plasma diagnostic interpretations.
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