Publication details
Analytical electron microscopy of plasma deposited carbon nanostructures
| Authors | |
|---|---|
| Year of publication | 2005 |
| Type | Article in Proceedings |
| Conference | Proceedings of 7th Multinational Congress on Microscopy |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | electron microscopy; carbon nanostructures; plasma |
| Description | Carbon nanostructures studied in this work were prepared by two methods. In both cases they were grown on Si substrates with Fe catalysts. As a first method, microwave plasma torch at atmospheric pressure was used, in second case CNTs were grown employing an inductively coupled plasma chemical vapor deposition (ICP-PVD). For microstructural studies, a Jeol JSM 6460 scanning electron microscope (SEM) with an Oxford Instruments INCA Energy analyser (EDX) and a Philips CM12 STEM transmission electron microscope (TEM) with an EDAX analyser were used. |
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