UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction

• Authors: VALTR Miroslav; KLAPETEK Petr; OHLÍDAL Ivan; FRANTA Daniel
• Year of publication: 2007
• Type: Article in Periodical
• Magazine / Source: Optoelectronics and Advanced Materials - Rapid Communications
• MU Faculty or unit: Faculty of Science
• Web: http://inoe.inoe.ro/oam-rc/
• Field: Plasma physics
• Keywords: Amorphous carbon;Thin film;Optical properties;a-C:H;UV enhanced oxidation;Reflectance spectra
• Description: UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction.

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