Publication details
DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 ATMOSPHEREIN N2 + HMDSO + O2 ATMOSPHERE
| Title in English | DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 ATMOSPHERE |
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| Authors | |
| Year of publication | 2008 |
| Type | Article in Periodical |
| Magazine / Source | Chemické Listy, II Central European Symposium on Plasma Chemistry 2008 |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | plasma deposition |
| Description | The aim of the work was to study the deposition of thin films in ATMOSPHERIC PRESSURE HOMOGENOUS DISCHARGE IN N2 + HMDSO + O2 atmosphere. The mechanical properties of films were studied by indentation techniques. The films exhibited hardnes in the range from 0.5 to 7 GPa depending on the deposition conditions. |
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