Ionization Processes and Plasma Chemistry in Pulsed RF Glow Discharge TOF Mass Spectroscopy for Thin Film Depth Profile Analyses

• Authors: GROZA A.; SURMEIAN A.; DIPLASU C.; TEMPEZ A.; CHAPON P.; LOBO L.; BORDEL L.; SCHMIDTOVÁ Tereza; VAŠINA Petr; BELENGUER P.; NELIS T.; GUILLOT P.; TUCCITO N.; LICCIARDELLO A.
• Year of publication: 2008
• Type: Article in Proceedings
• Conference: Book of Abstracts, Second Central European Symposium on Plasma Chemistry
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: depth profiles; TOF spectrometry
• Description: Ionization Processes and Plasma Chemistry in Pulsed RF Glow Discharge TOF Mass Spectroscopy for Thin Film Depth Profile Analyses, proceeding

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