Publication details
Optical Characterization of Ultra-Thin Iron and Iron Oxide Films
| Authors | |
|---|---|
| Year of publication | 2009 |
| Type | Article in Periodical |
| Magazine / Source | e-Journal of Surface Science and Nanotechnology |
| MU Faculty or unit | |
| Citation | |
| Field | Solid matter physics and magnetism |
| Keywords | iron; iron oxide; thin films; ellipsometry; spectrophotometry; X-ray reflection |
| Description | Ultra-thin films of 57Fe deposited on silicon substrates and SiOxCyHz support layers and subsequently oxidized in laboratory atmosphere are studied by two optical methods: the combination of UV/VIS/NIR spectroscopic ellipsometry and spectrophotometry, used to find layer thicknesses and optical constants, and X-ray specular reflectometry, used to obtain the electron density depth profile. The results of both methods are compared and found to be in a relatively good agreement. |
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