Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge

• Authors: SCHÄFER Jan; HORN Stefan; FOEST Rüdiger; BRANDENBURG Ronny; VAŠINA Petr; WELTMANN Klaus-Dieter
• Year of publication: 2011
• Type: Article in Periodical
• Magazine / Source: Surface & Coatings Technology
• MU Faculty or unit: Faculty of Science
• Doi: http://dx.doi.org/10.1016/j.surfcoat.2011.03.124
• Field: Plasma physics
• Keywords: SILVER NANOPARTICLES; PLASMA; JET
• Description: SiOx films are deposited with an atmospheric pressure dielectric barrier discharge (apDBD) using Ar, O2 and different precursor gases (HMDSO and Silane).An experimental study on the influence of the discharge operation parameters on the chemical composition of the deposited films and the vertical structure over the film thickness is carried out by means of SEM, EDX, and ATR–FTIR.

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