Department of Plasma Physics and Technology
Location: |
Kotlářská 267/2, 611 37 Brno, Pavilion 06
Kotlářská 267/2, 611 37 Brno, Pavilion 07 Correspondence Address: Kotlářská 267/2, 611 37 Brno |
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Phone: | +420 549 49 1435 +420 549 49 7914 +420 549 49 7943 |
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E-mail: |
Total number of publications: 47
Articles
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A Long-Term Study on the Bactericidal Effect of ZrN-Cu Nanostructured Coatings Deposited by an Industrial Physical Vapor Deposition System
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Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications
Vacuum, year: 2024, volume: 221, edition: March, DOI
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Complex characterisation of Cr-doped α-Al 2O3 for DBD applications
Journal of Physics D: Applied Physics, year: 2024, volume: 57, edition: January 2024, DOI
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Concentration measurements of atomic nitrogen in an atmospheric-pressure RF plasma jet using a picosecond TALIF
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Constitution, physical properties and thermodynamic modeling of the Hf-Mn system
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Depth profiling of W–Ta based fusion-relevant samples using picosecond laser ablation
Spectrochimica Acta Part B: Atomic Spectroscopy, year: 2024, volume: 216, edition: June 2024, DOI
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Development of a-C:H coatings doped with trimethylsilyl acetate prepared using plasma enhanced chemical vapor deposition
Diamond and Related Materials, year: 2024, volume: 147, edition: August 2024, DOI
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Effect of Nb incorporation in Mo BC coatings on structural and mechanical properties — Ab initio modelling and experiment
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Electric field and higher harmonics of RF plasma slit jet measured by antennas and VI probes
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Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering