doc. RNDr. Tomáš Homola, PhD.
Associate professor, Plasma Nanotechnologies and Bioapplications
office: pav. 07/02003
Kotlářská 267/2
611 37 Brno
| phone: | +420 549 49 4974, +420 739 384 616 |
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| e‑mail: |
| social and academic networks: |
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Total number of publications: 130
2020
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Low-Cost and High-Speed Atmospheric Plasma Processing of Perovskite Thin Films
11th International Conference on Nanomaterials - Research & Application NANOCON 2019, year: 2020
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Low-Temperature Hydrogen Plasma Reduction of Graphene Oxide Counter Electrodes for Printed Dye-Sensitized Solar Cells
11th International Conference on Nanomaterials - Research & Application NANOCON 2019, year: 2020
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Multi-hollow surface dielectric barrier discharge: an ozone generator with flexible performance and supreme efficiency
Plasma Sources Science and Technology, year: 2020, volume: 29, edition: 9, DOI
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Optimization of TiO2 Mesoporous Photoanodes Prepared by Inkjet Printing and Low-Temperature Plasma Processing
Plasma Chemistry and Plasma Processing, year: 2020, volume: 40, edition: 5, DOI
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Perovskite Solar Cells with Low-Cost TiO2 Mesoporous Photoanodes Prepared by Rapid Low-Temperature (70 degrees C) Plasma Processing
ACS Applied Energy Materials, year: 2020, volume: 3, edition: 12, DOI
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Roll-to-roll plazmový modul pro kontinuální povrchovou modifikaci flexibilních fotonických vrstev
Year: 2020
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Surface Property Tuning of Methylammonium Lead Iodide byPlasma for Use in Planar Perovskite Solar Cells
ACS Omega, year: 2020, volume: 5, edition: 29, DOI
2019
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A Study on the Effect of Ambient Air Plasma Treatment on the Properties of Methylammonium Lead Halide Perovskite Films
Metals, year: 2019, volume: 9, edition: 9, DOI
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A unique atmospheric-pressure plasma technology for low-cost industrial surface treatments of materials
International Conference on Heating by Electromagnetic Sources HES-19, Induction, Dielectric and Microwaves, Conduction & Electromagnetic Processing, year: 2019
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Efficiency of Ozone Production in Coplanar Dielectric Barrier Discharge
Plasma Chemistry and Plasma Processing, year: 2019, volume: 39, edition: 5, DOI