prof. RNDr. Ivan Ohlídal, DrSc.
Head, Optics for Thin films and Solid surfaces
Office: pav. 06/01031
Kotlářská 267/2
611 37 Brno
Phone: | +420 549 49 6244 |
---|---|
E‑mail: |
social and academic networks: |
---|
Total number of publications: 199
2006
-
Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry
Czech. J. Phys., year: 2006, volume: 56/2006, edition: Suppl. B
2005
-
AFM Study of Hydrocarbon Thin Films
WDS'05 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media (ed. J. Safrankova), year: 2005
-
Application of the wavelet transformation in AFM data analysis
Acta Physica Slovaca, year: 2005, volume: 55, edition: 3
-
Atomic force microscopy analysis of morphology of the upper boundaries of GaN thin films prepared by MOCVD
Vacuum, year: 2005, volume: 80, edition: 1-3
-
Atomic Force Microscope Tip Influence on the Fractal and Multi-Fractal Analyses of the Properties of Randomly Rough Surafaces
Nanoscale Calibration Standards and Methods: Dimensional and Related Measurements in the Micro-and Nanometer Range, year: 2005
-
Combination of optical methods and atomic force microscopy at characterization of thin film systems
Acta physica slovaca, year: 2005, volume: 55, edition: 3
-
Comparison of effective medium approximation and Rayleigh-Rice theory concerning ellipsometric characterization of rough surfaces
Optics Communications, year: 2005, volume: 248, edition: 1
-
Digital two-wavelength holographic interference microscopy for surface roughness measurement
Proceedings of SPIE 5945, 14th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, year: 2005
-
Ellipsometry in characterization of thin films
Proceedings of the SREN 2005, year: 2005
-
Evidence of refractive index change in glass substrates induced by high-density reactive ion plating deposition of SiO2 films
Applied Surface Science, year: 2005, volume: 244, edition: 1-4