Publication details

TF-P2-17 Preparation of Hard nc-TiC/a-C:H Coatings Using Hybrid PVD-PECVD Process with Rotating Cylindrical Magnetron



Year of publication 2013
Type Conference abstract
MU Faculty or unit

Faculty of Science

Description Hybrid PVD-PECVD process of titanium sputtering in a mixture of argon and acetylene combines aspects of both conventional techniques: sputtering of a rotating cylindrical titanium sputtering target (target size: 110 x 510 mm) by DC power and deposition from plasma activated acetylene which acts as a source of carbon for polymerization (PECVD). Titanium carbide/carbon nanocomposite hard coatings, which consist of TiC nanocrystallites embedded in amorphous carbon matrix (nc-TiC/a-C:H coating), were deposited on high speed steel and tungsten carbide cermet substrates which were placed on a DC biasable holder performing complex rotation around the Ti cathode. nc-TiC/a-C:H coatings with varying chemical composition prepared at 10 kW DC power (320 C), 20 kW (450 C) and 30 kW (450 C) and bias of -100 V reached maximal hardness of 24 GPa, 37 GPa and 28 GPa respectively. Because it could be expected that the optimal composition of the coating leading to maximal hardness should be reached independently on the applied power a process study was performed. Ti/Ar line intensity and discharge voltage showed sudden drop at the conditions where the maximal hardness was reached. EDX analyses show also sudden drop in Ti atomic concentration at this moment.
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