Publication details

Technologie pro depozici materiálu napařováním

Title in English Technology for thin film deposition by arc
Authors

HNILICA Jaroslav KLEIN Peter BERNÁTOVÁ Katarína ŠLAPANSKÁ Marta VAŠINA Petr

Year of publication 2019
MU Faculty or unit

Faculty of Science

Description The proposed technology shows that the use of a DC arc leads to more than twice as fast layer deposition as a pulsed arc, making the process much more efficient and less energy-consuming. However, using a pulsed arc, the ion flux is increased by almost one order, resulting in higher quality layers (lower roughness or greater density), resulting in the higher added value of the layers.
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