Publication details

Optical spectroscopy for sputtering process characterization

Authors

BRITUN Nikolay HNILICA Jaroslav

Year of publication 2020
Type Article in Periodical
Magazine / Source Journal of Applied Physics
MU Faculty or unit

Faculty of Science

Citation
Web https://aip.scitation.org/doi/10.1063/5.0006586
Doi http://dx.doi.org/10.1063/5.0006586
Keywords magnetron sputtering; HiPIMS; spectroscopy; plasma diagnostics; sputtering process
Description In this Tutorial, various methods of optical spectroscopy representing certain interest for magnetron discharge characterization are overviewed. The main principles, the implementation examples, and the selected results are given for each technique, accompanied by short discussions and suggestions for further reading. Both passive and active optical methods are covered, including optical absorption and laser-based techniques. The advantages and drawbacks of each diagnostic approach are critically analyzed. Special attention is devoted to the techniques extensively used by the authors in their own work, such as line ratio methods, absorption spectroscopy, interferometry, and laser-induced fluorescence.
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