Publication details

Selective Cu electroplating enabled by surface patterning and enhanced conductivity of carbon fiber reinforced polymers upon air plasma etching

Authors

RAFAILOVIĆ Lidija D. TRIŠOVIĆ Tomislav STUPAVSKÁ Monika SOUČEK Pavel VELICSANYI Peter NIXON Sonja ELBATAIOUI Adam ZAK Stanislav CORDILL Megan J. HOHENWARTER Anton KLEBER Christoph RÁHEĽ Jozef

Year of publication 2024
Type Article in Periodical
Magazine / Source Journal of Alloys and Compounds
MU Faculty or unit

Faculty of Science

Citation
Web https://www.sciencedirect.com/science/article/pii/S0925838824011563
Doi http://dx.doi.org/10.1016/j.jallcom.2024.174569
Keywords Composite materials; Air plasma etching; Nanofabrications; In-situ SEM impedance; Selective metallization; Cu microstructure
Description We demonstrate a sustainable post-processing of carbon fiber reinforced epoxy polymer (CFRP) composites by air plasma etching that permits regular electroconductive surface patterning through direct Cu galvanic metallization, in contrast to the untreated composite. Our study reveals a significant property dependence of the composite with respect to the position to the fiber/matrix composite surface and treatment. The enhancement in electrical conductivity was not compromised by the lower structural integrity of the composite, as the embedded carbon fibers remained unaffected by the air plasma etching process. The metallized Cu domains on the composite exhibit good hardness and excellent solderability potential. Thus, the electroconductive surface patterning of the composite, preceding galvanic metallization, facilitates the selective deposition of Cu layer domains. This step by step process, relying on the creation of selective electroconductive areas on the composite by plasma etching, enables galvanic metallization. Consequently, it enhances the potential for multifunctional composite applications. The feasibility of galvanic metallization brings new perspectives in selective metallization of composites by allowing the tailoring of the metal layer thickness, microstructure and selection of the metal.

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