Publication details
Technologie pro měření rychlosti růstu vrstvy a ionizace rozprášeného kovu při depozici s velmi vysokým výkonem
| Title in English | Technology for measuring the deposition rate and ionisation of sputtered metal during very high-power deposition |
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| Authors | |
| Year of publication | 2024 |
| Type | Pilot plant, certified technology, variety, breed |
| MU Faculty or unit | |
| Description | The proposed technology demonstrates reliable performance in measuring the deposition rate and the flow of sputtered metal atoms and ions during direct current magnetron sputtering at very high power levels. |
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