Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces

• Authors: LEHOCKÝ Marian; SŤAHEL Pavel; KOUTNÝ Marek; ČECH Jan; INSTITORIS Jakub; MRÁČEK Aleš
• Year of publication: 2008
• Type: Article in Periodical
• Magazine / Source: Journal of Materials Processing Technology
• MU Faculty or unit: Faculty of Science
• Field: Plasma physics
• Keywords: Rhodococcus; Plasma deposition; Cell adhesion; Barrier discharge; Thin films
• Description: Investigation of Rhodococcus SP.S3E2 and Rhodococcus SP.S3E3 adhesion to hydrophobic teflon like films and organosilicon films deposited on the paper substrate.

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