Publication details
Application of higher harmonic frequencies generated in RF plasmas for monitoring of deposition processes
| Authors | |
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| Year of publication | 2011 |
| Type | Conference abstract |
| MU Faculty or unit | |
| Citation | |
| Description | Higher harmonic frequencies of discharge voltage or current were analyzed and used for monitoring of various deposition techniques. It was shown that higher harmonics sensitively react on creation of a thin film, which can be used for simple monitoring of plasma processes. |
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