prof. RNDr. Ivan Ohlídal, DrSc.
Head, Optics for Thin films and Solid surfaces
Office: pav. 06/01031
Kotlářská 267/2
611 37 Brno
Phone: | +420 549 49 6244 |
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E‑mail: |
social and academic networks: |
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Total number of publications: 199
2016
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Optical characterization of SiO2 thin films using universal dispersion model over wide spectral range
Conference on Optical Micro- and Nanometrology VI, year: 2016
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Simultaneous determination of optical constants, local thickness and roughness of ZnSe thin films by imaging spectroscopic reflectometry
Journal of Optics, year: 2016, volume: 18, edition: 1, DOI
2015
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Dispersion model for optical thin films applicable in wide spectral range
Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, year: 2015
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Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films
Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, year: 2015
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Simultaneous determination of dispersion model parameters and local thickness of thin films by imaging spectrophotometry
Applied Surface Science, year: 2015, volume: 350, edition: SEP, DOI
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Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry
Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, year: 2015
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Universal dispersion model for characterization of optical thin films over wide spectral range: Application to hafnia
Applied Optics, year: 2015, volume: 54, edition: 31, DOI
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Wide spectral range characterization of antireflective coatings and their optimization
Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, year: 2015
2014
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Antireflexní vrstva z materiálů Al2O3/SiO2 pro hlubokou ultrafialovou (DUV) oblast spektra na vlnové délce 266nm
Year: 2014
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Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry
Thin Solid Films, year: 2014, volume: 571, edition: november, DOI